Overview of Ultrafast Laser Systems
The Ultrafast Laser Systems at CRANN are unique laser systems with different repetition rates and tenability from 226 nm to 2600 nm.
System 1 – High Power, High Repetition Rate, Short Pulse, widely tunable laser system
A stand-alone Femtosecond laser system with high repetition (80 MHz), high power system in conjunction with a wide range of wavelengths produced using harmonic generation. An Optical Parametric Oscillator (OPO) extends the tunable range of the system into the IR. A pulse picker is used to reduce the repetition rate of the laser.
System 2 – Medium repetition rate, amplified, tunable laser system
The laser amplifier system deliver tunable output between 480 nm and 2600 nm with the use of OPA’s at a repetition rate up to 250 kHz and with pulses of width less than 225fs autocorrelation width.
System 3 – Low repetition rate, short pulse, amplified, tunable laser system
An amplified Ti:Sapphire laser system operating at 1 kHz producing high power (> 3.5 W) and femtosecond pulses (< 130 fs). The center wavelength is 800 nm and tunability from 750 nm to 900 nm.
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The Ultrafast Laser Systems are useful tools in the investigations of fast photodynamic processes in physics, chemistry and biology. There are many techniques, such as time-resolved absorption spectroscopy, time-resolved fluorescence spectroscopy and coherent anti-Stokes Raman spectroscopy, have been developed though the world. CRANN is going to build our own ultrafast laser laboratory to investigate the dynamic processes in materials and the interactions between laser and materials, principally in nanoscale materials such as quantum dots.